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WebPlasma Enhanced Atomic Layer Deposition publications using TiCl4, CAS# 7550-45-0. 2024 Year in Review. February 2024 Stats. The publication database currently has 1673 entries. … WebAs a result, a lower resistivity (20% at the given growth temperature compared to TiN films with the conventional TiCl4 + NH3 ALD process. Owing to the effect of H2S during the ALD surface reaction, the Cl impurity was reduced substantially (1%) in the TiN film, which eventually decreased the resistivity of the TiN film. texas off highway sticker
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